Method for removing contaminants by brushing

In a method of cleaning a substrate, a solution is applied to the substrate through a brush which also scrubs the substrate. Alternatively, (i) the substrate is scrubbed with a brush, an HF soln. is applied to the substrate and the brush is rinsed; or (ii) the substrate is placed in a scrubber, a fi...

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Bibliographische Detailangaben
Hauptverfasser:	DELARIOS, JOHN M, RAVKIN, MIKHAIL, GARDNER, DOUGLAS, G
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	BASIC ELECTRIC ELEMENTS BRUSHES BRUSHWARE CLEANING CLEANING IN GENERAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY HUMAN NECESSITIES PERFORMING OPERATIONS PREVENTION OF FOULING IN GENERAL SEMICONDUCTOR DEVICES TRANSPORTING
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Beschreibung
Zusammenfassung:	In a method of cleaning a substrate, a solution is applied to the substrate through a brush which also scrubs the substrate. Alternatively, (i) the substrate is scrubbed with a brush, an HF soln. is applied to the substrate and the brush is rinsed; or (ii) the substrate is placed in a scrubber, a first scrubbing cycle is carried out at a first station where a first soln . is applied to the substrate through the brush, a second scrubbing cycle is carried out at a second station using a second soln. and second brush and the brush is rinsed. Also claimed is an appts. for carrying out the process. Pref. a PVA brush is used.