Off-axis levelling in lithographic projection apparatus

In an off-axis levelling procedure a height map of the substrate (W) is generated at a measurement station. The height map is referenced to a physical reference surface of the substrate table (WT). The physical reference surface may be a surface in which is inset a transmission image sensor (TIS). A...

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Bibliographische Detailangaben
Hauptverfasser:	JASPER, JOHANNES CHRISTIAAN MARIA, HEUTS, FREDERIK THEODORUS ELISABETH, LOOPSTRA, ERIK ROELOF, MODDERMAN, THEODORUS MARINUS, GEMEN, JACOBUS, DU CROO DE JONGH, RICHARD JOHAN HENDRIK, KLINKHAMER, JACOB FREDRIK FRISO, BOONMAN, MARCUS EMILE JOANNES, NIJMEIJER, GERRIT JOHANNES, CASTENMILLER, THOMAS JOSEPHUS MARIA, VAN ASTEN, NICOLAAS, ANTONIUS ALLEGONDUS JOHANNES
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	In an off-axis levelling procedure a height map of the substrate (W) is generated at a measurement station. The height map is referenced to a physical reference surface of the substrate table (WT). The physical reference surface may be a surface in which is inset a transmission image sensor (TIS). At the exposure station the height of the physical reference surface is measured and related to the focal plane of the projection lens (PL). The height map can then be used to determine the optimum height and/or tilt of substrate table to position the exposure area on the substrate in best focus during exposure. The same principles can be applied to (reflective) masks.