PHOTORESIST DEVELOPER AND METHOD OF DEVELOPMENT

An aqueous photolithographic resist developer composition including a metal alkali, a dialkylalkanolamine adjuvant, a surfactant, and a buffer increases the speed of novolak resin-based resists exposed to high energy radiation to permit high resolution photolithographic patterning of the resist. A m...

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Bibliographische Detailangaben
1. Verfasser:	TAN, ZOILO, CHENG, HO
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	An aqueous photolithographic resist developer composition including a metal alkali, a dialkylalkanolamine adjuvant, a surfactant, and a buffer increases the speed of novolak resin-based resists exposed to high energy radiation to permit high resolution photolithographic patterning of the resist. A multi-cycle process, in combination with the developer composition of this invention, enables resist resolution capabilities of less than 0.20 mu m, with contrast >5, and dark loss less than 10%.