CIRCUITRY AND METHOD FOR AN ELECTROPLATING PLANT OR ETCHING PLANT PULSE POWER SUPPLY

The circuit arrangement and method for supplying pulsed current to electrolytic cells according to the invention are used in electroplating systems. To supply current to each electrolytic cell, there are provided two galvanic rectifiers 5, 32 and one change-over switch 12 with respectively two indiv...

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Bibliographische Detailangaben
1. Verfasser:	MAURER, MANFRED
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	APPARATUS THEREFOR CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS CHEMISTRY ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROFORMING ELECTROLYTIC OR ELECTROPHORETIC PROCESSES MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS METALLURGY PRINTED CIRCUITS PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTIONOF COATINGS PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROMOBJECTS
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Beschreibung
Zusammenfassung:	The circuit arrangement and method for supplying pulsed current to electrolytic cells according to the invention are used in electroplating systems. To supply current to each electrolytic cell, there are provided two galvanic rectifiers 5, 32 and one change-over switch 12 with respectively two individual switches 23, 24, one output of the rectifiers being connected via a first electric line 33 with the one terminal of the electrolytic cell, the respective other outputs of the rectifiers being connected each via a second electric line 34, 35 with the inputs of the change-over switches, and the output 18 of the change-over switch being connected with the other terminal of the electrolytic cell, a capacitor 20, 21 being respectively connected, in addition, between the first electric line and the second electric lines. Periodic pulse sequences are generated by alternate opening and closing said separate switches.