SINGLE CRYSTAL SILICON CARBIDE AND PROCESS FOR PREPARING THE SAME

SINGLE CRYSTAL SILICON CARBIDE AND PROCESS FOR PREPARING THE SAME

According to the invention, a complex (M) which is formed by growing a polycrystalline beta -SiC plate (2) on the surface of a single crystal alpha -SiC base material (1) by the thermal CVD method is heat-treated at a high temperature of 1,900 to 2,400 DEG C, whereby polycrystals of the polycrystall...

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Bibliographische Detailangaben
1. Verfasser: TANINO, KICHIYA
Format: Patent
Sprache:eng ; fre ; ger
Schlagworte:
AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUSPOLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE
APPARATUS THEREFOR
BASIC ELECTRIC ELEMENTS
CHEMISTRY
COMPOUNDS THEREOF
CRYSTAL GROWTH
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
INORGANIC CHEMISTRY
METALLURGY
NON-METALLIC ELEMENTS
PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITHDEFINED STRUCTURE
REFINING BY ZONE-MELTING OF MATERIAL
SEMICONDUCTOR DEVICES
SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITHDEFINED STRUCTURE
SINGLE-CRYSTAL-GROWTH
UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL ORUNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL
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Beschreibung
Zusammenfassung:According to the invention, a complex (M) which is formed by growing a polycrystalline beta -SiC plate (2) on the surface of a single crystal alpha -SiC base material (1) by the thermal CVD method is heat-treated at a high temperature of 1,900 to 2,400 DEG C, whereby polycrystals of the polycrystalline cubic beta -SiC plate (2) are transformed into a single crystal, so that the single crystal is oriented in the same direction as the crystal axis of the single crystal alpha -SiC base material (1) and integrated with the single crystal of the single crystal alpha -SiC base material (1) to be largely grown. As a result, single crystal SiC of high quality which has a very reduced number of lattice defects and micropipe defects can be efficiently produced while ensuring a sufficient size in the term of area.