PROCESS CONTROL SYSTEM
A process management system in accordance with the present invention comprises an inspection apparatus for detecting physical positional coordinates of a defect on a wafer; and an operating testing apparatus for detecting an operating state of a chip on the wafer. Said inspection apparatus and said...
Gespeichert in:
Hauptverfasser: | , , , , , , , , , , , , , , , , , |
---|---|
Format: | Patent |
Sprache: | eng ; fre ; ger |
Schlagworte: | |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
container_end_page | |
---|---|
container_issue | |
container_start_page | |
container_title | |
container_volume | |
creator | MIYAZAKI, ISAO ISOGAI, SEIJI WATANABE, KENJI ISHIKAWA, SEIJI HAMADA, TOSHIMITSU OHYAMA, YUICHI SHIBA, MASATAKA ASAKAWA, TERUSHIGE NAKAZATO, JUN SUGIMOTO, HIDEKUNI ARIGA, MAKOTO SHIGYO, YOSHIHARU YOSHITAKE, YASUHIRO SUZUKI, IKUO IKOTA, MASAMI NOZOE, MARI MIZUNO, FUMIO YOKOUCHI, TETSUJI |
description | A process management system in accordance with the present invention comprises an inspection apparatus for detecting physical positional coordinates of a defect on a wafer; and an operating testing apparatus for detecting an operating state of a chip on the wafer. Said inspection apparatus and said operating testing apparatus are connected through a communication network, and the inspection information and image information obtained from said apparatuses is collected to construct a data base and an image file. The system further comprises at least one of means for specifying said physical positional coordinates on the wafer based on logical positional coordinates obtained from said operating testing apparatus and means for specifying logical positional coordinates of said operating testing apparatus based on physical positional coordinates obtained from said inspection apparatus. |
format | Patent |
fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_EP0910123A4</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>EP0910123A4</sourcerecordid><originalsourceid>FETCH-epo_espacenet_EP0910123A43</originalsourceid><addsrcrecordid>eNrjZBALCPJ3dg0OVnD29wsJ8vdRCI4MDnH15WFgTUvMKU7lhdLcDApuriHOHrqpBfnxqcUFicmpeakl8a4BBpaGBoZGxo4mxkQoAQCQwx7w</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>PROCESS CONTROL SYSTEM</title><source>esp@cenet</source><creator>MIYAZAKI, ISAO ; ISOGAI, SEIJI ; WATANABE, KENJI ; ISHIKAWA, SEIJI ; HAMADA, TOSHIMITSU ; OHYAMA, YUICHI ; SHIBA, MASATAKA ; ASAKAWA, TERUSHIGE ; NAKAZATO, JUN ; SUGIMOTO, HIDEKUNI ; ARIGA, MAKOTO ; SHIGYO, YOSHIHARU ; YOSHITAKE, YASUHIRO ; SUZUKI, IKUO ; IKOTA, MASAMI ; NOZOE, MARI ; MIZUNO, FUMIO ; YOKOUCHI, TETSUJI</creator><creatorcontrib>MIYAZAKI, ISAO ; ISOGAI, SEIJI ; WATANABE, KENJI ; ISHIKAWA, SEIJI ; HAMADA, TOSHIMITSU ; OHYAMA, YUICHI ; SHIBA, MASATAKA ; ASAKAWA, TERUSHIGE ; NAKAZATO, JUN ; SUGIMOTO, HIDEKUNI ; ARIGA, MAKOTO ; SHIGYO, YOSHIHARU ; YOSHITAKE, YASUHIRO ; SUZUKI, IKUO ; IKOTA, MASAMI ; NOZOE, MARI ; MIZUNO, FUMIO ; YOKOUCHI, TETSUJI</creatorcontrib><description>A process management system in accordance with the present invention comprises an inspection apparatus for detecting physical positional coordinates of a defect on a wafer; and an operating testing apparatus for detecting an operating state of a chip on the wafer. Said inspection apparatus and said operating testing apparatus are connected through a communication network, and the inspection information and image information obtained from said apparatuses is collected to construct a data base and an image file. The system further comprises at least one of means for specifying said physical positional coordinates on the wafer based on logical positional coordinates obtained from said operating testing apparatus and means for specifying logical positional coordinates of said operating testing apparatus based on physical positional coordinates obtained from said inspection apparatus.</description><edition>7</edition><language>eng ; fre ; ger</language><subject>BASIC ELECTRIC ELEMENTS ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; SEMICONDUCTOR DEVICES</subject><creationdate>2000</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20000823&DB=EPODOC&CC=EP&NR=0910123A4$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25563,76318</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20000823&DB=EPODOC&CC=EP&NR=0910123A4$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>MIYAZAKI, ISAO</creatorcontrib><creatorcontrib>ISOGAI, SEIJI</creatorcontrib><creatorcontrib>WATANABE, KENJI</creatorcontrib><creatorcontrib>ISHIKAWA, SEIJI</creatorcontrib><creatorcontrib>HAMADA, TOSHIMITSU</creatorcontrib><creatorcontrib>OHYAMA, YUICHI</creatorcontrib><creatorcontrib>SHIBA, MASATAKA</creatorcontrib><creatorcontrib>ASAKAWA, TERUSHIGE</creatorcontrib><creatorcontrib>NAKAZATO, JUN</creatorcontrib><creatorcontrib>SUGIMOTO, HIDEKUNI</creatorcontrib><creatorcontrib>ARIGA, MAKOTO</creatorcontrib><creatorcontrib>SHIGYO, YOSHIHARU</creatorcontrib><creatorcontrib>YOSHITAKE, YASUHIRO</creatorcontrib><creatorcontrib>SUZUKI, IKUO</creatorcontrib><creatorcontrib>IKOTA, MASAMI</creatorcontrib><creatorcontrib>NOZOE, MARI</creatorcontrib><creatorcontrib>MIZUNO, FUMIO</creatorcontrib><creatorcontrib>YOKOUCHI, TETSUJI</creatorcontrib><title>PROCESS CONTROL SYSTEM</title><description>A process management system in accordance with the present invention comprises an inspection apparatus for detecting physical positional coordinates of a defect on a wafer; and an operating testing apparatus for detecting an operating state of a chip on the wafer. Said inspection apparatus and said operating testing apparatus are connected through a communication network, and the inspection information and image information obtained from said apparatuses is collected to construct a data base and an image file. The system further comprises at least one of means for specifying said physical positional coordinates on the wafer based on logical positional coordinates obtained from said operating testing apparatus and means for specifying logical positional coordinates of said operating testing apparatus based on physical positional coordinates obtained from said inspection apparatus.</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>SEMICONDUCTOR DEVICES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2000</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZBALCPJ3dg0OVnD29wsJ8vdRCI4MDnH15WFgTUvMKU7lhdLcDApuriHOHrqpBfnxqcUFicmpeakl8a4BBpaGBoZGxo4mxkQoAQCQwx7w</recordid><startdate>20000823</startdate><enddate>20000823</enddate><creator>MIYAZAKI, ISAO</creator><creator>ISOGAI, SEIJI</creator><creator>WATANABE, KENJI</creator><creator>ISHIKAWA, SEIJI</creator><creator>HAMADA, TOSHIMITSU</creator><creator>OHYAMA, YUICHI</creator><creator>SHIBA, MASATAKA</creator><creator>ASAKAWA, TERUSHIGE</creator><creator>NAKAZATO, JUN</creator><creator>SUGIMOTO, HIDEKUNI</creator><creator>ARIGA, MAKOTO</creator><creator>SHIGYO, YOSHIHARU</creator><creator>YOSHITAKE, YASUHIRO</creator><creator>SUZUKI, IKUO</creator><creator>IKOTA, MASAMI</creator><creator>NOZOE, MARI</creator><creator>MIZUNO, FUMIO</creator><creator>YOKOUCHI, TETSUJI</creator><scope>EVB</scope></search><sort><creationdate>20000823</creationdate><title>PROCESS CONTROL SYSTEM</title><author>MIYAZAKI, ISAO ; ISOGAI, SEIJI ; WATANABE, KENJI ; ISHIKAWA, SEIJI ; HAMADA, TOSHIMITSU ; OHYAMA, YUICHI ; SHIBA, MASATAKA ; ASAKAWA, TERUSHIGE ; NAKAZATO, JUN ; SUGIMOTO, HIDEKUNI ; ARIGA, MAKOTO ; SHIGYO, YOSHIHARU ; YOSHITAKE, YASUHIRO ; SUZUKI, IKUO ; IKOTA, MASAMI ; NOZOE, MARI ; MIZUNO, FUMIO ; YOKOUCHI, TETSUJI</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_EP0910123A43</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; fre ; ger</language><creationdate>2000</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>SEMICONDUCTOR DEVICES</topic><toplevel>online_resources</toplevel><creatorcontrib>MIYAZAKI, ISAO</creatorcontrib><creatorcontrib>ISOGAI, SEIJI</creatorcontrib><creatorcontrib>WATANABE, KENJI</creatorcontrib><creatorcontrib>ISHIKAWA, SEIJI</creatorcontrib><creatorcontrib>HAMADA, TOSHIMITSU</creatorcontrib><creatorcontrib>OHYAMA, YUICHI</creatorcontrib><creatorcontrib>SHIBA, MASATAKA</creatorcontrib><creatorcontrib>ASAKAWA, TERUSHIGE</creatorcontrib><creatorcontrib>NAKAZATO, JUN</creatorcontrib><creatorcontrib>SUGIMOTO, HIDEKUNI</creatorcontrib><creatorcontrib>ARIGA, MAKOTO</creatorcontrib><creatorcontrib>SHIGYO, YOSHIHARU</creatorcontrib><creatorcontrib>YOSHITAKE, YASUHIRO</creatorcontrib><creatorcontrib>SUZUKI, IKUO</creatorcontrib><creatorcontrib>IKOTA, MASAMI</creatorcontrib><creatorcontrib>NOZOE, MARI</creatorcontrib><creatorcontrib>MIZUNO, FUMIO</creatorcontrib><creatorcontrib>YOKOUCHI, TETSUJI</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>MIYAZAKI, ISAO</au><au>ISOGAI, SEIJI</au><au>WATANABE, KENJI</au><au>ISHIKAWA, SEIJI</au><au>HAMADA, TOSHIMITSU</au><au>OHYAMA, YUICHI</au><au>SHIBA, MASATAKA</au><au>ASAKAWA, TERUSHIGE</au><au>NAKAZATO, JUN</au><au>SUGIMOTO, HIDEKUNI</au><au>ARIGA, MAKOTO</au><au>SHIGYO, YOSHIHARU</au><au>YOSHITAKE, YASUHIRO</au><au>SUZUKI, IKUO</au><au>IKOTA, MASAMI</au><au>NOZOE, MARI</au><au>MIZUNO, FUMIO</au><au>YOKOUCHI, TETSUJI</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>PROCESS CONTROL SYSTEM</title><date>2000-08-23</date><risdate>2000</risdate><abstract>A process management system in accordance with the present invention comprises an inspection apparatus for detecting physical positional coordinates of a defect on a wafer; and an operating testing apparatus for detecting an operating state of a chip on the wafer. Said inspection apparatus and said operating testing apparatus are connected through a communication network, and the inspection information and image information obtained from said apparatuses is collected to construct a data base and an image file. The system further comprises at least one of means for specifying said physical positional coordinates on the wafer based on logical positional coordinates obtained from said operating testing apparatus and means for specifying logical positional coordinates of said operating testing apparatus based on physical positional coordinates obtained from said inspection apparatus.</abstract><edition>7</edition><oa>free_for_read</oa></addata></record> |
fulltext | fulltext_linktorsrc |
identifier | |
ispartof | |
issn | |
language | eng ; fre ; ger |
recordid | cdi_epo_espacenet_EP0910123A4 |
source | esp@cenet |
subjects | BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES |
title | PROCESS CONTROL SYSTEM |
url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-10T13%3A49%3A04IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=MIYAZAKI,%20ISAO&rft.date=2000-08-23&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EEP0910123A4%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |