PROCESS CONTROL SYSTEM

A process management system in accordance with the present invention comprises an inspection apparatus for detecting physical positional coordinates of a defect on a wafer; and an operating testing apparatus for detecting an operating state of a chip on the wafer. Said inspection apparatus and said...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	MIYAZAKI, ISAO, ISOGAI, SEIJI, WATANABE, KENJI, ISHIKAWA, SEIJI, HAMADA, TOSHIMITSU, OHYAMA, YUICHI, SHIBA, MASATAKA, ASAKAWA, TERUSHIGE, NAKAZATO, JUN, SUGIMOTO, HIDEKUNI, ARIGA, MAKOTO, SHIGYO, YOSHIHARU, YOSHITAKE, YASUHIRO, SUZUKI, IKUO, IKOTA, MASAMI, NOZOE, MARI, MIZUNO, FUMIO, YOKOUCHI, TETSUJI
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	A process management system in accordance with the present invention comprises an inspection apparatus for detecting physical positional coordinates of a defect on a wafer; and an operating testing apparatus for detecting an operating state of a chip on the wafer. Said inspection apparatus and said operating testing apparatus are connected through a communication network, and the inspection information and image information obtained from said apparatuses is collected to construct a data base and an image file. The system further comprises at least one of means for specifying said physical positional coordinates on the wafer based on logical positional coordinates obtained from said operating testing apparatus and means for specifying logical positional coordinates of said operating testing apparatus based on physical positional coordinates obtained from said inspection apparatus.