METHOD OF POST-ETCHING A MECHANICALLY TREATED SUBSTRATE

Method of providing a pattern of apertures and/or cavities in, for example, a glass duct plate of a plasma-addressed liquid crystal display, in which first a mechanical treatment is performed (for example, by means of powder blasting) and then a wet-chemical etching treatment is performed to render...

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Hauptverfasser: BUSIO, JOHANNES, MARIA, MARCUS, IN'T VELD, FREDERIK, HENDRIK, LARSEN, POUL, KJERPY, SPIERINGS, GIJSBERTUS, ADRIANUS, CORNELUS, MARIA, POSTMA, LAMBERTUS, VAN DER PUTTEN, JAN, BAPTIST, PETRUS, HENRIKUS
Format: Patent
Sprache:eng ; fre ; ger
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Zusammenfassung:Method of providing a pattern of apertures and/or cavities in, for example, a glass duct plate of a plasma-addressed liquid crystal display, in which first a mechanical treatment is performed (for example, by means of powder blasting) and then a wet-chemical etching treatment is performed to render the walls of the ducts microscopically less rough so that the optical disturbance is reduced and the glass becomes clearer again.