Electrostatic chuck having a unidirectionally conducting coupler layer

An electrostatic chuck (20) for holding a substrate in a process chamber (80), having a voltage supply terminal (65) for charging the chuck. The chuck includes an electrostatic member (25) comprising at least one electrode (30) covered by an electrically insulated holding surface (40) for holding a...

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Bibliographische Detailangaben
Hauptverfasser:	KHOLODENKO, ARNOLD, VEYTSER, ALEXANDER M, SHAMOUILIAN, SHAMOUIL
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL COMBINATIONS OR ASSOCIATIONS OF METAL-WORKING MACHINES, NOTDIRECTED TO A PARTICULAR RESULT CONVERSION OR DISTRIBUTION OF ELECTRIC POWER DETAILS, COMPONENTS, OR ACCESSORIES FOR MACHINE TOOLS, e.g.ARRANGEMENTS FOR COPYING OR CONTROLLING DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC MACHINES NOT OTHERWISE PROVIDED FOR ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS GENERATION INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL MACHINE TOOLS MACHINE TOOLS IN GENERAL CHARACTERISED BY THE CONSTRUCTION OFPARTICULAR DETAILS OR COMPONENTS METAL-WORKING NOT OTHERWISE PROVIDED FOR METALLURGY PERFORMING OPERATIONS SEMICONDUCTOR DEVICES SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION TECHNICAL SUBJECTS COVERED BY FORMER USPC TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS TRANSPORTING
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Beschreibung
Zusammenfassung:	An electrostatic chuck (20) for holding a substrate in a process chamber (80), having a voltage supply terminal (65) for charging the chuck. The chuck includes an electrostatic member (25) comprising at least one electrode (30) covered by an electrically insulated holding surface (40) for holding a substrate thereon, and an electrical contact surface (48) for providing charge to the electrode. A unidirectionally conducting coupler (70) electrically couples the contact surface (48) of the electrostatic member to the voltage supply terminal (65) to conduct charge substantially only in a single direction from the terminal to the contact surface. Preferably, an electrical connector (50) having a junction surface (55) is bonded to the electrical contact surface (48), and a terminal surface (60) for electrically contacting the voltage supply terminal, electrically couples the unidirectionally conducting coupler (70) to the voltage supply terminal (65).