Method of forming contact structure
A method of fabricating semiconductor structures, particularly contact structures, forms features of differing sizes at different points in the semiconductor process, so as to enhance lithographic resolution.
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Format: | Patent |
Sprache: | eng ; fre ; ger |
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Zusammenfassung: | A method of fabricating semiconductor structures, particularly contact structures, forms features of differing sizes at different points in the semiconductor process, so as to enhance lithographic resolution. |
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