Resist materials

A lithographic process for device fabrication and an energy sensitive material for use in the lithographic process for device fabrication is disclosed. In the process, a layer of energy sensitive material is formed over the surface of a substrate. An image of a pattern is delineated into the energy...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	HOULIHAN, FRANCIS MICHAEL, NALAMASU, OMKARAM
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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