Resist materials

A lithographic process for device fabrication and an energy sensitive material for use in the lithographic process for device fabrication is disclosed. In the process, a layer of energy sensitive material is formed over the surface of a substrate. An image of a pattern is delineated into the energy...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	HOULIHAN, FRANCIS MICHAEL, NALAMASU, OMKARAM
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	A lithographic process for device fabrication and an energy sensitive material for use in the lithographic process for device fabrication is disclosed. In the process, a layer of energy sensitive material is formed over the surface of a substrate. An image of a pattern is delineated into the energy sensitive material using radiation with a wavelength in the of 220 nm to 300 nm. The pattern is then developed. After the pattern is developed into the resist, it is transferred into the underlying substrate. The resist material contains a polymer with acetal or ketal acid sensitive moieties in combination with a photoacid generator that releases an acid with a pKa of less than two when exposed to radiation within the above described range.