Residue removal by supercritical fluids

A method for the removal of residue from an etched precision surface such as a semiconductor sample is provided which comprises exposing said precision surface to a supercritical fluid or liquid CO2 under appropriate conditions that are sufficient to remove the residue from the precision surface. Cr...

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Bibliographische Detailangaben
Hauptverfasser: ROTHMAN, LAURA BETH, PURTELL, ROBERT JOSEPH, WU, JIN-JWANG, MCCULLOUGH, KENNETH JOHN
Format: Patent
Sprache:eng ; fre ; ger
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Beschreibung
Zusammenfassung:A method for the removal of residue from an etched precision surface such as a semiconductor sample is provided which comprises exposing said precision surface to a supercritical fluid or liquid CO2 under appropriate conditions that are sufficient to remove the residue from the precision surface. Cryogenic aerosol may be used in conjunction with either the supercritical fluid or liquid CO2.