Resist composition with radiation sensitive acid generator

A radiation sensitive resist compsn. comprises: (a) bis (lower alkyl phenyl) iodonium camphor sulphonate; and (b) a copolymer comprising hydroxystyrene and (meth)acrylate having an acid-clearable substituent.

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Bibliographische Detailangaben
Hauptverfasser:	ITO, HIROSHI, HOFER, DONALD C, BREYTA, GREGORY, DIPIETRO, RICHARD A
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	A radiation sensitive resist compsn. comprises: (a) bis (lower alkyl phenyl) iodonium camphor sulphonate; and (b) a copolymer comprising hydroxystyrene and (meth)acrylate having an acid-clearable substituent.