Work supplying method and apparatus to batch process apparatus for semiconductor wafer
A processing end time calculation section (11) of a batch formation control section (6) refers to a history file (8) in response to a processing start report from a batch process apparatus (1, 1a) to predict a processing end time. A work extraction section (12) refers to a step management file (9) t...
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Format: | Patent |
Sprache: | eng ; fre ; ger |
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Zusammenfassung: | A processing end time calculation section (11) of a batch formation control section (6) refers to a history file (8) in response to a processing start report from a batch process apparatus (1, 1a) to predict a processing end time. A work extraction section (12) refers to a step management file (9) to extract those of the works which can arrive at a batch process apparatus (1, 1a) on or prior to the thus predicted processing end time. A batch formation section (13) forms, designating the thus extracted works as an object of batch formation, the works into a batch such that one of the works which has the highest preferential degree is designated as a top work of the batch. A transport section (4) transports the works of the batch collectively to the batch process apparatus (1, 1a). |
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