Antihalation/acutance system for photothermographic materials
A method of imaging a photothermographic material comprising exposing said material comprising at least one photothermographic medium to a source of narrow band radiation, said material comprising one or more non-sensitising acutance or antihalation dyes associated with said medium providing an abso...
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| Hauptverfasser: | , |
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| Format: | Patent |
| Sprache: | eng ; fre ; ger |
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| Zusammenfassung: | A method of imaging a photothermographic material comprising exposing said material comprising at least one photothermographic medium to a source of narrow band radiation, said material comprising one or more non-sensitising acutance or antihalation dyes associated with said medium providing an absorption maximum ( lambda max) within 10nm of the wavelength of maximum output of the narrow band source and an optical density of at least 0.05 at a wavelength ( lambda max +50)nm. |
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