Method for manufacturing surface emitting laser diodes

The mfr. method involves using a semiconductor substrate, e.g. gallium arsenide, with a mechanical mask having controlled openings to make sides at typically 45 degrees. These sides can form Bragg reflectors by alternating materials, notably gallium arsenide and gallium aluminium arsenide. In a firs...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: HIRTZ, JEAN-PIERRE, MAUREL, PHILIPPE, GARCIA, JEANARLES
Format: Patent
Sprache:eng ; fre ; ger
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