Protective collar for a vacuum seal in a plasma etch reactor

The disclosure relates to a vacuum seal that can be used in a plasma etch reactor to seal the chamber interior (10) from the outside environment consists of a protective collar (66) that is injection molded or machined of a high strength, high temperature and corrosion resistant thermoplastic materi...

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Bibliographische Detailangaben
Hauptverfasser:	ASKARINAM, ERIC, RICE, MICHAEL
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY PERFORMING OPERATIONS PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL SEMICONDUCTOR DEVICES THEIR RELEVANT APPARATUS TRANSPORTING
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Beschreibung
Zusammenfassung:	The disclosure relates to a vacuum seal that can be used in a plasma etch reactor to seal the chamber interior (10) from the outside environment consists of a protective collar (66) that is injection molded or machined of a high strength, high temperature and corrosion resistant thermoplastic material. The collar has an elastomeric gasket (68) installed therein and is used in combination with a second elastomeric gasket (76) to achieve a fluid-tight seal between two rigid surfaces (74,72) made of silicon and quartz, respectively.