METHOD OF MONITORING ATMOSPHERIC PRESSURE GLOW DISCHARGE PLASMA

The generation of glow plasma due to discharge at an atmospheric pressure and its stabilization are monitored by counting the number of current pulses. Alternatively, they are monitored by the change of a retention voltage and/or the change of the full current value besides the number of the current...

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Bibliographische Detailangaben
Hauptverfasser:	OGOMA, MASUHIRO, OKAZAKI, SATIKO
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY PLASMA TECHNIQUE PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	The generation of glow plasma due to discharge at an atmospheric pressure and its stabilization are monitored by counting the number of current pulses. Alternatively, they are monitored by the change of a retention voltage and/or the change of the full current value besides the number of the current pulses, or by Lissajous figures, to detect the plasma state and to stabilize and control the plasma. These procedures make it possible to stabilize and monitor the atmospheric pressure glow discharge plasma accurately, rapidly and readily, and to control the plasma.