Device for avoiding arcing in vacuum sputtering apparatuses

The invention relates to a device for preventing arcing in vacuum sputtering apparatuses. This device contains a pulse generator (12) which moves the cathode (5) of the sputtering apparatus to predetermined distances away from positive potential, as a result of which a discharge takes place from lay...

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Bibliographische Detailangaben
Hauptverfasser:	THORN, GERNOT, STUERMER, JOHANN, LUEBBEHUSEN, MICHAEL
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	The invention relates to a device for preventing arcing in vacuum sputtering apparatuses. This device contains a pulse generator (12) which moves the cathode (5) of the sputtering apparatus to predetermined distances away from positive potential, as a result of which a discharge takes place from layers on a target (7). This discharge prevents high voltages building up, which can lead to arcing.