PHOTORESIST STRIPPER
Photo resist stripper compositions comprising N-alkyl-2-pyrrolidone, 1,2-propanediol and tetraalkylammonium hydroxide. The photoresist strippers are useful at high stripping temperatures (105 DEG C.-125 DEG C.) to remove hard baked photoresist without damaging semiconductor substrates or metallurgy.
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| creator | HAVAS, JANOS FITZSIMMONS, JOHN, A DEAN, ALICIA MCCORMICK, BARRY, C SHAH, PROBODH, R |
| description | Photo resist stripper compositions comprising N-alkyl-2-pyrrolidone, 1,2-propanediol and tetraalkylammonium hydroxide. The photoresist strippers are useful at high stripping temperatures (105 DEG C.-125 DEG C.) to remove hard baked photoresist without damaging semiconductor substrates or metallurgy. |
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| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_EP0531292B1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>EP0531292B1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_EP0531292B13</originalsourceid><addsrcrecordid>eNrjZBAJ8PAP8Q9yDfYMDlEIDgnyDAhwDeJhYE1LzClO5YXS3AwKbq4hzh66qQX58anFBYnJqXmpJfGuAQamxoZGlkZOhsZEKAEAY3Aejg</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>PHOTORESIST STRIPPER</title><source>esp@cenet</source><creator>HAVAS, JANOS ; FITZSIMMONS, JOHN, A ; DEAN, ALICIA ; MCCORMICK, BARRY, C ; SHAH, PROBODH, R</creator><creatorcontrib>HAVAS, JANOS ; FITZSIMMONS, JOHN, A ; DEAN, ALICIA ; MCCORMICK, BARRY, C ; SHAH, PROBODH, R</creatorcontrib><description>Photo resist stripper compositions comprising N-alkyl-2-pyrrolidone, 1,2-propanediol and tetraalkylammonium hydroxide. The photoresist strippers are useful at high stripping temperatures (105 DEG C.-125 DEG C.) to remove hard baked photoresist without damaging semiconductor substrates or metallurgy.</description><edition>6</edition><language>eng ; fre ; ger</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; BASIC ELECTRIC ELEMENTS ; CINEMATOGRAPHY ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; SEMICONDUCTOR DEVICES</subject><creationdate>1997</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19970102&DB=EPODOC&CC=EP&NR=0531292B1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76516</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19970102&DB=EPODOC&CC=EP&NR=0531292B1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>HAVAS, JANOS</creatorcontrib><creatorcontrib>FITZSIMMONS, JOHN, A</creatorcontrib><creatorcontrib>DEAN, ALICIA</creatorcontrib><creatorcontrib>MCCORMICK, BARRY, C</creatorcontrib><creatorcontrib>SHAH, PROBODH, R</creatorcontrib><title>PHOTORESIST STRIPPER</title><description>Photo resist stripper compositions comprising N-alkyl-2-pyrrolidone, 1,2-propanediol and tetraalkylammonium hydroxide. The photoresist strippers are useful at high stripping temperatures (105 DEG C.-125 DEG C.) to remove hard baked photoresist without damaging semiconductor substrates or metallurgy.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>SEMICONDUCTOR DEVICES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>1997</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZBAJ8PAP8Q9yDfYMDlEIDgnyDAhwDeJhYE1LzClO5YXS3AwKbq4hzh66qQX58anFBYnJqXmpJfGuAQamxoZGlkZOhsZEKAEAY3Aejg</recordid><startdate>19970102</startdate><enddate>19970102</enddate><creator>HAVAS, JANOS</creator><creator>FITZSIMMONS, JOHN, A</creator><creator>DEAN, ALICIA</creator><creator>MCCORMICK, BARRY, C</creator><creator>SHAH, PROBODH, R</creator><scope>EVB</scope></search><sort><creationdate>19970102</creationdate><title>PHOTORESIST STRIPPER</title><author>HAVAS, JANOS ; FITZSIMMONS, JOHN, A ; DEAN, ALICIA ; MCCORMICK, BARRY, C ; SHAH, PROBODH, R</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_EP0531292B13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; fre ; ger</language><creationdate>1997</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>SEMICONDUCTOR DEVICES</topic><toplevel>online_resources</toplevel><creatorcontrib>HAVAS, JANOS</creatorcontrib><creatorcontrib>FITZSIMMONS, JOHN, A</creatorcontrib><creatorcontrib>DEAN, ALICIA</creatorcontrib><creatorcontrib>MCCORMICK, BARRY, C</creatorcontrib><creatorcontrib>SHAH, PROBODH, R</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>HAVAS, JANOS</au><au>FITZSIMMONS, JOHN, A</au><au>DEAN, ALICIA</au><au>MCCORMICK, BARRY, C</au><au>SHAH, PROBODH, R</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>PHOTORESIST STRIPPER</title><date>1997-01-02</date><risdate>1997</risdate><abstract>Photo resist stripper compositions comprising N-alkyl-2-pyrrolidone, 1,2-propanediol and tetraalkylammonium hydroxide. The photoresist strippers are useful at high stripping temperatures (105 DEG C.-125 DEG C.) to remove hard baked photoresist without damaging semiconductor substrates or metallurgy.</abstract><edition>6</edition><oa>free_for_read</oa></addata></record> |
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| language | eng ; fre ; ger |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES |
| title | PHOTORESIST STRIPPER |
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