Method for generation of ionized air

Ionization of air is accomplished by use of a laser beam focussed to a small focal volume (20) of intense electric field adjacent an object to be discharged, e.g. a semiconductor chip or wafer (26). The electric field is sufficiently intense to ionize air. In the manufacture of a semiconductor circuit chip (26), during those steps which are conducted in an air environment, opportunity exists to remove from a surface (28) of a chip, or wafer, charge acquired during the manufacturing process. The ionized air is passed along the chip surface. Ions (24) in the air discharge local regions of the chip surface which have become charged by steps of a manufacturing process. By way of further embodiment of the invention, the ionization may be produced by injection of molecules of water into the air, which molecules are subsequently ionized by a laser beam and directed toward the chip via a light shield with the aid of a magnetic field.