$Method of forming refractory metal free standing shapes$

Method of forming refractory metal free standing shapes

The invention relates to a method of forming a free standing shape made of a material containing refractory metal comprising the steps of providing a mandrel in a CVD enclosure, injecting a refractory metal halide gas and a reducing gas in said enclosure, reacting said gases in said enclosure to gen...

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Bibliographische Detailangaben
Hauptverfasser:	JALBY, PIERRE, KIMURA, MASAO, ARAI, JUICHI, CLAVERIE, PIERRE, ROTMAN, FREDERIC, FRIEDT, JEAN-MARIE, ROOM 104, MANOIR FUSUKAWA 19
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	The invention relates to a method of forming a free standing shape made of a material containing refractory metal comprising the steps of providing a mandrel in a CVD enclosure, injecting a refractory metal halide gas and a reducing gas in said enclosure, reacting said gases in said enclosure to generate a material containing refractory metal, growing a layer of said material containing refractory metal on said mandrel, then removing the mandrel to obtain said free standing shape. According to the invention, the reducing gas is selected among the silicon hydride gases and their mixtures. Pure refractory metal as well as anti-corrosion WSiz layers are obtained : multi layers free standing shapes can be made in a continuous process.