Thick deposited cobalt platinum magnetic film and method of fabrication thereof
A 3,000-10,000 angstrom thick cobalt-platinum (CoPt) magnetic film is deposited onto a chromium (Cr) or tungsten (W) overlayer on a substrate, or is deposited directly onto the substrate. The deposited film has an appreciable component of its C-axis, which is parallel to the [00.2] direction, lying...
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Sprache: | eng ; fre ; ger |
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Zusammenfassung: | A 3,000-10,000 angstrom thick cobalt-platinum (CoPt) magnetic film is deposited onto a chromium (Cr) or tungsten (W) overlayer on a substrate, or is deposited directly onto the substrate. The deposited film has an appreciable component of its C-axis, which is parallel to the [00.2] direction, lying in the plane of the film. The component of the C-axis lies in the plane of the film throughout the entire thickness of the CoPt film, and the resultant magnetic film has a coercivity from 1,300-2,000 oersteds, depending upon which, if any, overlayer is included. The method for producing the magnetic film of the invention teaches sputtering the overlayer onto a substrate maintained approximately at room temperature in an atmosphere of inert gas. After ajdusting the pressure of the gas and controlling the distance between the CoPt sputtering target and the substrate, CoPt is sputtered such that the depositing Co and Pt atoms are thermalized while traversing the distance between the target and the substrate. The film as deposited is magnetically isotropic in the plane, and may configured as a permanent magnet having a resultant magnetization in the plane by exposure to an external magnetizing field oriented along the film plane. |
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