Method and device for measuring temperature radiation using a pyrometer wherein compensation lamps are used

Method for measuring the radiation originating from one side of a wafer of semiconductor material using a pyrometer, wherein compensation radiation is projected onto that side to compensate for the reflectivity of the wafer of material and wherein the intensity of the compensation radiation is contr...

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Bibliographische Detailangaben
Hauptverfasser: VANDENABEELE, PETER MICHEL NOEL, MAEX, KAREN IRMA JOZEF
Format: Patent
Sprache:eng ; fre ; ger
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Beschreibung
Zusammenfassung:Method for measuring the radiation originating from one side of a wafer of semiconductor material using a pyrometer, wherein compensation radiation is projected onto that side to compensate for the reflectivity of the wafer of material and wherein the intensity of the compensation radiation is controlled subject to the amount of radiation measured by the pyrometer.