Optical device including a grating structure

Substrate-supported optical device structures such as, e.g., quantum-well infrared detectors/detector arrays are provided with a diffraction grating (14) for optical coupling. Preferred gratings (14) are formed in a nonepitaxial layer which, preferably, consists of a material which is different from...

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Bibliographische Detailangaben
Hauptverfasser:	HOLLENHORST, JAMES NOLAN, MORGAN, ROBERT ANTHONY, MUEHLNER, DIRK JOACHIM, CHI, GOUUNG
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	BASIC ELECTRIC ELEMENTS DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY FREQUENCY-CHANGING NON-LINEAR OPTICS OPTICAL ANALOGUE/DIGITAL CONVERTERS OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICAL LOGIC ELEMENTS OPTICS PHYSICS SEMICONDUCTOR DEVICES TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF
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Beschreibung
Zusammenfassung:	Substrate-supported optical device structures such as, e.g., quantum-well infrared detectors/detector arrays are provided with a diffraction grating (14) for optical coupling. Preferred gratings (14) are formed in a nonepitaxial layer which, preferably, consists of a material which is different from underlying semiconductor material (12). Conveniently, a grating pattern is formed by etching, with the underlying material serving as an etch stop. For example, on a GaAs-AlGaAs device, polycrystalline silicon can be deposited and etched in this fashion.