Method of polishing lacquered surfaces

A novel process for polishing highly resilient coating surfaces, in which the surface to be polished is kept at a temperature of less than +5 DEG C by means of a cold gas during the polishing process.

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Bibliographische Detailangaben
Hauptverfasser:	SCHOENFELDER, MANFRED, HOEFER, HANS-JOACHIM, LAUHOFF, HORST
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL DRESSING OR CONDITIONING OF ABRADING SURFACES FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS GRINDING MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING PERFORMING OPERATIONS POLISHING PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL SPRAYING OR ATOMISING IN GENERAL TRANSPORTING
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Beschreibung
Zusammenfassung:	A novel process for polishing highly resilient coating surfaces, in which the surface to be polished is kept at a temperature of less than +5 DEG C by means of a cold gas during the polishing process.