Apparatus for treatment of a process gas

The apparatus for treatment of a process gas comprises a vacuum pump provided with a heating portion (8) for preventing adhesion of reaction products on a discharge side (3) thereof.

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Bibliographische Detailangaben
Hauptverfasser:	UEYAMA, KEIJI, GYOBU, ICHIRO, AWADA, YOSHIHISA, NAGAOKA, TAKASHI, MURAMATSU, KIMIO, NISHIUCHI, AKIRA, MASE, MASAHIRO
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	BLASTING HEATING LIGHTING MECHANICAL ENGINEERING NON-POSITIVE DISPLACEMENT PUMPS POSITIVE DISPLACEMENT MACHINES FOR LIQUIDS PUMPS FOR LIQUIDS OR ELASTIC FLUIDS WEAPONS
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Beschreibung
Zusammenfassung:	The apparatus for treatment of a process gas comprises a vacuum pump provided with a heating portion (8) for preventing adhesion of reaction products on a discharge side (3) thereof.