DIRECT WAFER TEMPERATURE CONTROL

Means for directly measuring the temperature of a wafer in a vacuum system is disclosed. The means comprise a tube, containing a thermocouple, extending through a portion of the system. The tube is sealed at one end to an aperture in the wall of the system and sealed at the other end with removable...

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Bibliographische Detailangaben
Hauptverfasser:	ROSLER, RICHARD S, PRICE, J.B
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY MEASURING MEASURING QUANTITY OF HEAT MEASURING TEMPERATURE PHYSICS SEMICONDUCTOR DEVICES TESTING THERMALLY-SENSITIVE ELEMENTS NOT OTHERWISE PROVIDED FOR
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Beschreibung
Zusammenfassung:	Means for directly measuring the temperature of a wafer in a vacuum system is disclosed. The means comprise a tube, containing a thermocouple, extending through a portion of the system. The tube is sealed at one end to an aperture in the wall of the system and sealed at the other end with removable sealant.