PROCESS FOR REMOVING COS AND CS 2 COMPOUNDS CONTAINED IN AN INDUSTRIAL GAS

PCT No. PCT/FR85/00358 Sec. 371 Date Sep. 11, 1986 Sec. 102(e) Date Sep. 11, 1986 PCT Filed Dec. 11, 1985 PCT Pub. No. WO86/03426 PCT Pub. Date Jun. 19, 1986.A process is provided for eliminating COS and CS2 compounds contained in an industrial gas. The gas containing an appropriate quantity of wate...

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1. Verfasser: VOIRIN, ROBERT
Format: Patent
Sprache:eng ; fre
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Zusammenfassung:PCT No. PCT/FR85/00358 Sec. 371 Date Sep. 11, 1986 Sec. 102(e) Date Sep. 11, 1986 PCT Filed Dec. 11, 1985 PCT Pub. No. WO86/03426 PCT Pub. Date Jun. 19, 1986.A process is provided for eliminating COS and CS2 compounds contained in an industrial gas. The gas containing an appropriate quantity of water vapor is contacted with a titanium oxide catalyst arranged in a high temperature reaction zone. The reaction is carried out while maintaining at specific values the ratio R between the number of water vapor moles and the number of moles of the compound(s) COS and CS2 in the supplied gas in contact with the catalyst, as well as the temperature at the outlet from the reaction zone. The process is applicable to the treatment of industrial gases usable in organic synthesis and containing COS and CS2 as impurities susceptible of perturbating synthesis reactions.