METHOD OF FORMING A PHOTORESIST PATTERN

Bibliographische Detailangaben

Hauptverfasser:	KAWAZU, RYUJI OKI ELECTRIC IND. CO., LTD, ITOH, TOSHIO OKI ELECTRIC IND. CO., LTD, ASANO, TAKATERU FUJI ICALS IND. CO., LTD, KOBAYASHI, KENJI FUJI ICALS IND. CO., LTD, YAMASHITA, YOSHIO OKI ELECTRIC IND. CO., LTD
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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