METHOD AND APPARATUS FOR CONTROLLING THE CHEMICAL-THERMAL TREATMENT OF WORK PIECES IN A FLOW DISCHARGE

The method and device for controlling the thermo chemical treatment of workpieces in slow discharge in a medium of treating gas, includes operating stages of warm-up with simultaneous intensive cathode sputtering, diffusion saturation, and cooling of treated workpieces. During each stage the workpie...

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Hauptverfasser:	MINTCHEV, MINTCHO SAVOV, SHIVAROV, GEORGI STEFANOV, SAVOV, SVETOSLAV ALEXANDROV, NITCHEV, PETER TODOROV
Format:	Patent
Sprache:	eng ; ger
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	The method and device for controlling the thermo chemical treatment of workpieces in slow discharge in a medium of treating gas, includes operating stages of warm-up with simultaneous intensive cathode sputtering, diffusion saturation, and cooling of treated workpieces. During each stage the workpiece temperature, the frequency of occurring arc discharges and the glow discharge voltage are measured and compared with preset values. Corresponding error signals and control signals are obtained and used to regulate the treated workpiece temperature and the arc discharge frequency using the discharge current value, and the glow discharge voltage using the flow rate value of one of at least two treating gases that enter the working chamber, a preset value of glow discharge voltage corresponding to each treating gas.