LASER-BASED SYSTEM FOR THE TOTAL REPAIR OF PHOTOMASKS

A low power laser-based system for repairing clear and opaque defects in a photomask. The system includes a laser source for providing a beam having a wavelength between 0.40 mu m and 2.0 mu m. The beam is coupled to a computer controlled scanning device which scans the beam across a defective area...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	OPRYSKO, MODEST M, YOUNG, PETER L
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	A low power laser-based system for repairing clear and opaque defects in a photomask. The system includes a laser source for providing a beam having a wavelength between 0.40 mu m and 2.0 mu m. The beam is coupled to a computer controlled scanning device which scans the beam across a defective area of the photomask to repair the defect by thermal deposition of micron-size films on the defect or by laser-induced degradation of a polymer coating the defect. Excess metal is removed from the photomask surface via laser vaporization.