LIGHT-SENSITIVE COMPOSITION AND PROCESS FOR THE PREPARATION OF RELIEF COPIES

A process for the production of negative relief copies, wherein a photosensitive material comprising at least one o-quinone diazide and at least one quaternary ammonium compound is imagewise exposed, heated, and then uniformly exposed before developing, involves reduced heat-treatment temperatures a...

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Bibliographische Detailangaben
1. Verfasser:	GUZZI, ALBERTO
Format:	Patent
Sprache:	eng ; ger
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR AUXILIARY PROCESSES IN PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR,STEREO-PHOTOGRAPHIC PROCESSES PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES PHYSICS
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Beschreibung
Zusammenfassung:	A process for the production of negative relief copies, wherein a photosensitive material comprising at least one o-quinone diazide and at least one quaternary ammonium compound is imagewise exposed, heated, and then uniformly exposed before developing, involves reduced heat-treatment temperatures and durations, and does not require the use of toxic amines.