DRY PROCESS FOR FORMING METAL PATTERNS ON A SURFACE

The process for forming a desired metal pattern on a substrate (35) comprises forming a mask of a thermally depolymerizable polymer (40) on the substrate (35) with a pattern of openings (70) complementary to the desired metal pattern, blanket coating the substrate (35) and the mask (40) with a metal...

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Bibliographische Detailangaben
Hauptverfasser:	ANDERSON, HERBERT RUDOLPH, JR, ARAPS, CONSTANCE JOAN, LOTSKO, CATHERINE AGNES
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY CINEMATOGRAPHY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL MATERIALS THEREFOR METALLURGY ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	The process for forming a desired metal pattern on a substrate (35) comprises forming a mask of a thermally depolymerizable polymer (40) on the substrate (35) with a pattern of openings (70) complementary to the desired metal pattern, blanket coating the substrate (35) and the mask (40) with a metal (60), heating the substrate (35) to depolymerize the depolymerizable polymer (40), cooling the surface of the metal (60) to thereby delaminate the metal coated in areas where thermally depolymerizable polymer (40) is present, removing the delaminated metal where necessary, and optionally plasma etching the depolymerized polymer, if residue thereof remains, to remove the same from said substrate.