Alignment apparatus for machines making integrated circuits
1. An alignment device for an apparatus for printing integrated circuits, comprising a reticle holding table (5) carrying a reticle and provided with means for moving it within its plane, at least along two mutually orthogonal directions x and y corresponding to two main axes of the reticle ; a tabl...
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Format: | Patent |
Sprache: | eng ; fre ; ger |
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Zusammenfassung: | 1. An alignment device for an apparatus for printing integrated circuits, comprising a reticle holding table (5) carrying a reticle and provided with means for moving it within its plane, at least along two mutually orthogonal directions x and y corresponding to two main axes of the reticle ; a table (6) for receiving a semiconductor wafer provided with at least one alignment mark (8), said table being provided with means for moving it along two directions which are conjugate with directions x and y ; photoreducing means (4) located between the tables ; means for illuminating the reticle with actinic light for exposing the semiconductor wafer through said optical means (4) ; and means for simultaneous observation for determination of coincidence between an alignment mark on the wafer and a reference mark on the reticle, having a microscope (10) provided with an optical element (15) which brings back towards the microscope the illuminating light which is reflected by the reticle and the illuminating light reflected by the wafer through the photoreducing optical means (4), characterized in that the optical element (15) is switchable between a condition where it is clear of the illuminating beam and a condition where it directs a thin beam of lighting light from a source incorporated to the microscope and having the same wave length as the illuminating light through the reference mark toward the wafer.
Le dispositif d'alignement, utilisable dans un photorépéteur sur tranche, permet d'aligner un motif de référence (7) porté par un réticule (8) avec un motif d'alignement porté par la tranche de silicium sur laquelle doit être répété le tracé du réticule. Ce dispositif comprend un microscope déplaçable suivant deux directions x et y conjuguées des directions de déplacement du réticule et de la tranche, et un miroir de visée (15). Ce miroir est déplaçable entre une position où il dégage le trajet du faisceau provenant d'un insolateur (3) et un état dans lequel il dirige un pinceau de lumière d'éclairage provenant d'une source (17) à travers le motif de référence vers la tranche et ramène la lumière réfléchie vers le microscope en faisant passer le rayon moyen par le foyer objet (F) de l'objectif photoréducteur (4). |
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