MAGNETIC DISK SUBSTRATE POLISHING METHOD AND POLISHING PAD THEREFOR

The disclosure is directed to a method and apparatus for superfinishing magnetic disk substrates (25) using a non-friable polishing pad (10) including a high density polyurethane foam binder in which at least 50% by weight of classified hard particles are retained. Polishing occurs by rotating the p...

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Bibliographische Detailangaben
Hauptverfasser:	OTTMAN, JOHN CHARLES, SHEN, JOHN CHEN SYAN
Format:	Patent
Sprache:	eng
Schlagworte:	DRESSING OR CONDITIONING OF ABRADING SURFACES FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS GRINDING INFORMATION STORAGE INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORDCARRIER AND TRANSDUCER MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING PERFORMING OPERATIONS PHYSICS POLISHING TRANSPORTING
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Beschreibung
Zusammenfassung:	The disclosure is directed to a method and apparatus for superfinishing magnetic disk substrates (25) using a non-friable polishing pad (10) including a high density polyurethane foam binder in which at least 50% by weight of classified hard particles are retained. Polishing occurs by rotating the pad (10) against the surface (25) to be ultrafinished in the presence of a water soluble liquid vehicle, maintaining a minimum pressure of 0,35 Kgf/cm2 at a rotational speed that achieves the desired aggressiveness of the polishing media. The method and apparatus contemplate both the ultrafinishing of newly prepared substrate disks and the restoring of previously coated disks to a ultrafinished substrate condition without producing substances or conditions toxic to the ecology or the operator.