4-HALOGEN-5-(TRICHLOROMETHYL-PHENYL)-OXAZOLE DERIVATIVES, PROCESS FOR PREPARING THEM AND RADIATION-SENSITIVE COMPOSITIONS CONTAINING THEM
This invention relates to a novel 4-halogeno-5-(halogenomethyl-phenyl)-oxazole derivative; to a radiation-sensitive composition which, as the radiation-sensitive compound, contains a 4-halogeno-5-(halogenomethyl-phenyl)-oxazole derivative; and to a process for the preparation of the novel 4-halogeno...
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Format: | Patent |
Sprache: | eng ; ger |
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Zusammenfassung: | This invention relates to a novel 4-halogeno-5-(halogenomethyl-phenyl)-oxazole derivative; to a radiation-sensitive composition which, as the radiation-sensitive compound, contains a 4-halogeno-5-(halogenomethyl-phenyl)-oxazole derivative; and to a process for the preparation of the novel 4-halogeno-5-(halogenomethyl-phenyl)-oxazole derivatives. |
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