PLASMA AND ION SOURCE
1. Plasma and ion source generating in a limited volume on the basis of the electron cyclotron resonance a plasma by means of a magnetic field, the irradiation of microwaves and the supply of the gas to be ionized, with the use of a permanent magnet (1) provided with an axial bore (2) into which bot...
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Format: | Patent |
Sprache: | eng ; ger |
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Zusammenfassung: | 1. Plasma and ion source generating in a limited volume on the basis of the electron cyclotron resonance a plasma by means of a magnetic field, the irradiation of microwaves and the supply of the gas to be ionized, with the use of a permanent magnet (1) provided with an axial bore (2) into which both the microwaves (3) and the gas (4) can be introduced. |
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