Fremgangsmåde og apparat til måling af temperaturstråling ved anvendelse af et pyrometer udstyret med kompensationslamper

Fremgangsmåde og apparat til måling af temperaturstråling ved anvendelse af et pyrometer udstyret med kompensationslamper

Method for measuring the radiation originating from one side of a wafer of semiconductor material using a pyrometer, wherein compensation radiation is projected onto that side to compensate for the reflectivity of the wafer of material and wherein the intensity of the compensation radiation is contr...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: MAEX, KAREN IRMA JOZEF, VANDENABEELE, PETER MICHEL NOEL
Format: Patent
Sprache:dan
Schlagworte:
BASIC ELECTRIC ELEMENTS
COLORIMETRY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT,POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED,VISIBLE OR ULTRA-VIOLET LIGHT
MEASURING
PHYSICS
RADIATION PYROMETRY
SEMICONDUCTOR DEVICES
TESTING
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Beschreibung
Zusammenfassung:Method for measuring the radiation originating from one side of a wafer of semiconductor material using a pyrometer, wherein compensation radiation is projected onto that side to compensate for the reflectivity of the wafer of material and wherein the intensity of the compensation radiation is controlled subject to the amount of radiation measured by the pyrometer.