Leiterähnlicher Widerstand und Verfahren zu dessen Herstellung

The present invention relates to a method for manufacturing a resistor and a resistor with rough and fine adjustment of the resistance value under use of a resistor configuration, the method including a substrate; a pair of electrodes mounted on different ends of an upper surface of the substrate; a...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: ARIGA, SHUJI, ISEKI, TAKESHI
Format: Patent
Sprache:ger
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Beschreibung
Zusammenfassung:The present invention relates to a method for manufacturing a resistor and a resistor with rough and fine adjustment of the resistance value under use of a resistor configuration, the method including a substrate; a pair of electrodes mounted on different ends of an upper surface of the substrate; a main resistance path electrically connecting the electrodes; an adjusting area being arranged in parallel to the main resistance path; the method including a first rough adjustment step by providing a first slit groove vertical to the main resistance path in the adjusting area, and for fine adjustment providing another second slit groove parallel to the first slit groove.