Halbleiterbauelemente mit Beschichtung aus Tantalum-Aluminiumoxid
An active semiconductor device (10) includes a coating (14) comprising an oxide of tantalum and aluminum. The coating may function as an AR coating or as a passivation coating for a semiconductor laser device. Applications to ICs and optical devices are described.
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Zusammenfassung: | An active semiconductor device (10) includes a coating (14) comprising an oxide of tantalum and aluminum. The coating may function as an AR coating or as a passivation coating for a semiconductor laser device. Applications to ICs and optical devices are described. |
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