Verfahren zur Herstellung eines Si-O beinhaltenden Überzuges

Disclosed is a method for forming improved Si-O containing coatings on electronic substrates. The method comprises treating Si-O containing ceramic coatings derived from hydrogen silsesquioxane resin with hydrogen gas. The resultant coatings have improved properties such as stable dielectric constan...

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Bibliographische Detailangaben
Hauptverfasser: BALLANCE, DAVID STEPHEN, DUNN, DIANA KAY, CAMILLETTI, ROBERT CHARLES
Format: Patent
Sprache:ger
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Zusammenfassung:Disclosed is a method for forming improved Si-O containing coatings on electronic substrates. The method comprises treating Si-O containing ceramic coatings derived from hydrogen silsesquioxane resin with hydrogen gas. The resultant coatings have improved properties such as stable dielectric constants.