In basischem Medium entwickelbarer, negativer Photoresist und seine Verwendung

A composition containing novolak polymer, and/or poly(p-vinylphenol), an organometallic material, an amino polymer a cationic photocatalyst. The composition can also include a cosensitizer material which makes a composition sensitive to near U.V. radiation.

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Bibliographische Detailangaben
Hauptverfasser:	NUNES, SHARON L., HOPEWELL JUNCTION, N.Y. 12533, US, GELORME, JEFFREY D., PLAINVILLE, CONNECTICUT 06062, US, SERINO, RUSSELL J., RIDGEFIELD, CONNECTICUT 06877, US, WITMAN, DAVID F., PLEASANTVILLE, N.Y. 10570, US, BABICH, EDWARD D., CHAPPAQUA, N.Y. 10514, US, PARASZCZAK, JURIJ R., PLEASANTVILLE, N.Y. 10570, US, GALLIGAN, EILEEN A., HOPEWELL JUNCTION, N.Y. 12533, US, MCGOUEY, RICHARD P., CARMEL, N.Y. 10512, US
Format:	Patent
Sprache:	ger
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	A composition containing novolak polymer, and/or poly(p-vinylphenol), an organometallic material, an amino polymer a cationic photocatalyst. The composition can also include a cosensitizer material which makes a composition sensitive to near U.V. radiation.