KUPFERALUMINAT ENTHALTERDE PASTE AUF KUPFERBASIS FÜR MIKROSTRUKTURELLE UND SCHRUMPFUNGS-BEHERRSCHUNG VON KUPFERGEFÜLLTEN KONTAKTLÖCHERN

A copper-based paste is disclosed for filling vias in, and forming conductive surface patterns on, ceramic substrate packages for semiconductor chip devices. The paste contains copper aluminate powder in proper particle size and weight proportion to achieve grain size and shrinkage control of the vi...

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Hauptverfasser: DAVID, LAWRENCE, DANIEL, WAPPINGERS FALLS, NY 12590, US, MASTREANI, ANTHONY, HOPEWELL JUNCTION, NY 12533, US, VALLABHANENI, RAO, VENKATESWARA, WAPPINGERS FALLS, NY 12590, US, AOUDE, FARID, YOUSSIF, WAPPINGERS FALLS, NY 12590, US, DIVAKARUNI, RENUKA SHASTRI, RIDGEFIELD, CT 06877, US, FAROOQ, SHAJI, HOPEWELL JUNCTION, NY 12533, US, REDDY, SRINIVASA, S., N., LAGRANGEVILLE, NY 12540, US, HERRON, LESTER, WYNN, HOPEWELL JUNCTION, NY 12533, US, LASKY, HAL, MITCHELL, HYDE PARK, NY 12538, US, NATARAJAN, GOVINDARAJAN, PLEASANT VALLEY, NY 12569, US, WALL, DONALD RENE, WAPPINGERS FALLS, N.Y. 12590, US, SURA, VIVEK MADAN, PUNE - 411030, IN
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Zusammenfassung:A copper-based paste is disclosed for filling vias in, and forming conductive surface patterns on, ceramic substrate packages for semiconductor chip devices. The paste contains copper aluminate powder in proper particle size and weight proportion to achieve grain size and shrinkage control of the via and thick film copper produced by sintering. The shrinkage of the copper material during sintering is closely matched to that of the ceramic substrate.