Strahlungsempfindliche positiv arbeitende Lackzusammensetzung

A positive resist composition comprising a radiation-sensitive component, an alkali-soluble resin and a phenol compound of the formula: wherein R is a hydrogen atom, a lower alkyl group or a phenyl group, R' is an alkyl group or an alkoxy group, and n is a number of 0 to 3, which has well balan...

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Bibliographische Detailangaben
Hauptverfasser:	OSAKI, HARUYOSHI, TOYONAKA-SHI, OSAKA-FU, JP, UETANI, YASUNORI, TOYONAKA-SHI, OSAKA-FU, JP, HIOKI, TAKESHI, TONDABAYASHI-SHI, OSAKA-FU, JP, MORIUMA, HIROSHI, NARA-SHI, NARA-KEN, JP
Format:	Patent
Sprache:	ger
Schlagworte:	ACYCLIC OR CARBOCYCLIC COMPOUNDS APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CHEMISTRY CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR METALLURGY ORGANIC CHEMISTRY ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	A positive resist composition comprising a radiation-sensitive component, an alkali-soluble resin and a phenol compound of the formula: wherein R is a hydrogen atom, a lower alkyl group or a phenyl group, R' is an alkyl group or an alkoxy group, and n is a number of 0 to 3, which has well balanced good properties such as sensitivity, resolution, heat resistance and adhesiveness.