Geometrie und Gestaltungen eines Geräts zum Magnetronzerstäuben

The disclosures relates to a thin film coating system (10) incorporates separate, separately-controlled deposition and reaction zones for depositing materials such as refractory metals and forming oxides and other compounds and alloys of such materials. The associated process involves rotating or tr...

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Hauptverfasser: LEFEBVRE, PAUL M., SANTA ROSA, CALIFORNIA 95401, US, SEDDON, RICHARD I., SANTA ROSA, CALIFORNIA 95404, US, SOBERANIS, DAVID L., SANTA ROSA, CALIFORNIA 95404, US, WENTWORTH, PATRICK R., SANTA ROSA, CALIFORNIA 94501, US, ALLEN, THOMAS H., SANTA ROSA, CALIFORNIA 95405, US, VAN HORN, CRAIG C., SEBASTOPOL, CALIFORNIA 95472, US, SEESER, JAMES W., SANTA ROSA, CALIFORNIA 95404, US, HICHWA, BRYANT P., SANTA ROSA, CALIFORNIA 95404, US, KLINGER, ROBERT F., ROHNERT PARK, CALIFORNIA 94928, US, SCOBEY, MICHAEL A., MARLBOROUGH, MASSACHUSETTS 01752, US, ILLSLEY, ROLF F., SANTA ROSA, CALIFORNIA 95409, US, DICKEY, ERIK R., NORTHFIELD, MINNESOTA 55057, US, TEMPLE, MICHAEL D., SANTA ROSA, CALIFORNIA 95401, US
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Sprache:ger
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Zusammenfassung:The disclosures relates to a thin film coating system (10) incorporates separate, separately-controlled deposition and reaction zones for depositing materials such as refractory metals and forming oxides and other compounds and alloys of such materials. The associated process involves rotating or translating workpieces past the differentially pumped, atmospherically separate, sequentially or simultaneously operated deposition and reaction zones and is characterised by the ability to form a wide range of materials, by high throughput, and by controlled coating thickness, including both constant and selectively varied thickness profiles.