Verfahren zur Herstellung eines Beugungsgitters

A method for manufacturing a diffraction grating includes the steps of applying a resist (12,42), of which developing speed has the extreme value in regard to certain exposure intensity, to a substrate (1,31) on which the diffraction grating is to be formed, performing interference exposure with bea...

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Bibliographische Detailangaben
Hauptverfasser:	OHKURA, YUJI, FUJIWARA, MASATOSHI
Format:	Patent
Sprache:	ger
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY DEVICES USING STIMULATED EMISSION ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	A method for manufacturing a diffraction grating includes the steps of applying a resist (12,42), of which developing speed has the extreme value in regard to certain exposure intensity, to a substrate (1,31) on which the diffraction grating is to be formed, performing interference exposure with beam intensity in which the maximum and minimum values of exposure intensity are on both sides of intensity which makes the developing speed to be the extreme value, patterning the resist (12,42) by development, and etching the substrate (1,31) using the patterned resist (12,42) as a mask.