Lithographischer Apparat

A lithographic projection apparatus comprising a first radiation system (1) for providing a first projection beam of radiation (4), a second radiation system (11) for providing a second projection beam of radiation (14), a support structure for supporting a first patterning means (2) and a second pa...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	MULKENS, JOHANNES CATHARINUS HUBERTUS, MOERS, MARCO HUGO PETRUS
Format:	Patent
Sprache:	ger
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	A lithographic projection apparatus comprising a first radiation system (1) for providing a first projection beam of radiation (4), a second radiation system (11) for providing a second projection beam of radiation (14), a support structure for supporting a first patterning means (2) and a second patterning means (12), the first patterning means serving to pattern the first projection beam according to a first pattern and the second patterning means serving to pattern the second projection beam according to a first pattern; a substrate table for holding a substrate (25), a projection system (20) for combining the first (24) and second (224) patterned beams and projecting the combined beam (2224) onto a target portion of the substrate.