Verwendung von Wasser und angesäuertem Wasser zur Reinigung flüssiger MOCVD Vorläuferverbindungen

This invention relates to an improvement in a purification process for producing those liquid copper based complexes of β-diketones and, particularly the monovalent copper complexes of β-diketones, which are suited for application by chemical vapor deposition in the electronics industry. In the basi...

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Bibliographische Detailangaben
Hauptverfasser: ZORICH, ROBERT SAM, THURMOND, JAMES RICHARD, ROBERTS, DAVID ALLEN
Format: Patent
Sprache:ger
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Zusammenfassung:This invention relates to an improvement in a purification process for producing those liquid copper based complexes of β-diketones and, particularly the monovalent copper complexes of β-diketones, which are suited for application by chemical vapor deposition in the electronics industry. In the basic process for preparing a copper based complex, a reactive copper compound is reacted with a fluorinated β-diketonate and an organo source such as an olefinic source or one having acetylenic unsaturation. Purification is effected by contacting reaction product with a double deionized deoxygenated water source and preferably an acid/water source. An aqueous layer and an organic layer are formed with the aqueous layer containing byproducts and the organic phase containing product.